Topic: Large Area Fabrication of Meta-lens and Meta-hologram using Nanoimprint Lithography

Lecturer: Prof. Heon Lee

Time: January 14th, 2026, 16:00, UTC+8

Venue: First Floor, State Key Laboratory of Advanced Technology For Materials Synthesis and Processing

Host: State Key Laboratory of Advanced Technology For Materials Synthesis and Processing

Biography: Heon Lee obtained his Ph.D. from Stanford University in 1996. Thereafter, he worked successively at Bell Labs, Siemens Microelectronics, and HP Labs until 2003. Subsequently, in 2004, he joined the Department of Materials Science and Engineering at Korea University as a faculty member. His key research areas include nanoimprint lithography, radiative cooling, and metasurfaces. He has published 385 SCI-indexed papers, which have been cited 11,876 times.

Abstract: Metasurfaces, such as metalenses and metaholograms, offer compact and high-performance alternatives to conventional optical systems. However, their commercialization has been hindered by the high cost and difficulty of producing them over large areas. In this work, we demonstrate the fabrication of metasurfaces up to 12 inches in diameter using nanoimprint lithography. A high-refractive-index imprint resin - composed of a UV-curable polymer and high-index nanoparticles - was patterned with an elastomeric stamp. This approach also enables metasurface formation on non-flat and flexible substrates. Our results show that nanoimprint lithography can overcome the key barriers of cost and scalability, paving a practical path toward the commercialization of metasurface technology.

Rewritten by: Mei Mengqi

Edited by: Liang Muwei, Li Huihui, Li Tiantian

Source: State Key Laboratory of Advanced Technology For Materials Synthesis and Processing